摘要 |
本发明公开了一种由以下化学式1表示的用于硬罩幕组合物的单体、包括该单体的硬罩幕组合物、以及使用该硬罩幕组合物形成图案的方法。在以下化学式1中,A、A'、A"、L、L'、X、X'、m、和n与在具体实施方式中的定义相同。;Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer and a method of forming patterns using the same. ;In the above Chemical Formula 1, A, A', A", L, L', X, X', m and n are the same as defined in the detailed description. |