| 发明名称 |
Photomask Having a Blind Region Including Periodical Clear Portions |
| 摘要 |
A photo mask includes a plurality of dark patterns disposed on a transparent substrate, a first region, a shield region, and a second region. The first region includes the dark patterns that are disposed with a wider space than a first distance. The shield region is adjacent to the first region on the transparent substrate and is filled with the dark pattern. The second region is faced to the first region across the shield region and includes the dark patterns that are disposed with a narrower space than a second distance. The second distance is narrower than ninety percent of the first distance. |
| 申请公布号 |
US2015004532(A1) |
申请公布日期 |
2015.01.01 |
| 申请号 |
US201414300416 |
申请日期 |
2014.06.10 |
| 申请人 |
Micron Technology, Inc. |
发明人 |
KATO Katsuya |
| 分类号 |
G03F1/38 |
主分类号 |
G03F1/38 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A photo mask comprising:
a plurality of dark patterns disposed on a transparent substrate; a first region including the dark patterns that are disposed with a wider space than a first distance; a shield region, adjacent to the first region on the transparent substrate, being filled with the dark pattern; and a second region, faced to the first region across the shield region, including the dark patterns that are disposed with a narrow space than a second distance, wherein the second distance is narrower than ninety percent of the first distance. |
| 地址 |
Boise ID US |
