发明名称 |
METHOD AND APPARATUS FOR DATABASE-ASSISTED REQUALIFICATION RETICLE INSPECTION |
摘要 |
A method embodiment includes providing a reticle design data that specify a plurality of printable features that are formed on the wafer using the reticle and a plurality of nonprintable features that are not formed on the wafer using such reticle, wherein the reticle design data is usable to fabricate the reticle. A reduced design database is generated from the reticle design data and this reduced design database includes a description or map of the nonprintable features of the reticle, a description or map of a plurality of cell-to-cell regions of the reticle, and a grayscale reticle image that is rasterized from the reticle design data. The reduced design database, along with the reticle, is transferred to a fabrication facility so that the reduced design database is usable to periodically inspect the reticle in the fabrication facility. |
申请公布号 |
US2015005917(A1) |
申请公布日期 |
2015.01.01 |
申请号 |
US201214370101 |
申请日期 |
2012.10.01 |
申请人 |
KLA-Tencor Corporation |
发明人 |
Yiin Lih-Huah;Iyer Venkatraman K.;Shi Rui-fang |
分类号 |
G05B19/418;G06F17/30 |
主分类号 |
G05B19/418 |
代理机构 |
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代理人 |
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主权项 |
1. A method of providing design data information for inspection of a reticle in a wafer fabrication facility, the method comprising:
providing reticle design data that specify a plurality of printable features that are formed on the wafer using the reticle and a plurality of nonprintable features that are not formed on the wafer using such reticle, wherein the reticle design data is usable to fabricate the reticle; generating a reduced design database from the reticle design data, wherein the reduced design database includes a description or map of the nonprintable features of the reticle, a description or map of a plurality of cell-to-cell regions of the reticle, and a grayscale reticle image that is rasterized from the reticle design data; and transferring the reduced design database, along with the reticle, to a fabrication facility so that the reduced design database is usable to periodically inspect the reticle in the fabrication facility. |
地址 |
Milpitas CA US |