| 摘要 |
A photoresist composition containing (A) a polymer having a structural unit (I) that includes an acid-labile group, and (I) a compound represented by the following formula (1). In the following formula (1), R1, R2, R3 and R represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. X represents a single bond, an oxygen atom or —NRa—. Ra represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other. A− represents —SO3− or —CO2−. M+ represents a monovalent onium cation.; |
| 主权项 |
1. A photoresist composition comprising:
a polymer comprising a first structural unit that includes an acid-labile group; and a first compound represented by a formula (1): wherein, in the formula (1), R1, R2, R3 and R each independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, wherein two of R1, R2, R3 and R optionally taken together represent a ring structure by binding with each other; X represents a single bond, an oxygen atom or —NRa—, wherein Ra represents a hydrogen atom, a hydroxy group or a monovalent organic group having 1 to 20 carbon atoms, and optionally taken together represents a ring structure by binding with R each other; A− represents —SO3− or —CO2−; and M+ represents a monovalent onium cation, wherein in a case where A− represents —CO2−, at least one of R1, R2, R3 and R does not represent a hydrogen atom. |
