发明名称 SCHOTTKY DIODE STRUCTURE
摘要 The invention provides a Schottky diode structure. An exemplary embodiment of a Schottky diode structure includes a semiconductor substrate having an active region. A first well region having a first conductive type is formed in the active region. A first doped region having the first conductive type is formed on the first well region. A first electrode is disposed on the active region, covering the first doped region. A second electrode is disposed on the active region, contacting to the first well region. A gate structure is disposed on the first well region. A second doped region, having a second conductive type opposite to the first conductive type, and is formed on the first well region. The gate structure and the second doped region are disposed between the first and second electrodes.
申请公布号 US2015001666(A1) 申请公布日期 2015.01.01
申请号 US201313927468 申请日期 2013.06.26
申请人 Media Tek Inc. 发明人 CHIANG Puo-Yu
分类号 H01L29/872 主分类号 H01L29/872
代理机构 代理人
主权项 1. A Schottky diode structure, comprising: a semiconductor substrate having an active region; a first well region having a first conductive type formed in the active region; a first doped region having the first conductive type formed on the first well region; a first electrode disposed on the active region, covering the first doped region; a second electrode disposed on the active region, contacting to the first well region; a gate structure disposed on the first well region; and a second doped region, having a second conductive type opposite to the first conductive type, formed on the first well region, wherein the gate structure and the second doped region are disposed between the first and second electrodes.
地址 Hsin-Chu TW