发明名称 |
LIGHT-EMITTING DEVICE AND ELECTRONIC APPARATUS |
摘要 |
A first light-emitting element and a second light-emitting element that have a resonance structure that causes output light from a light-emission functional layer to resonate between a reflective layer and a semi-transmissive reflective layer, and a pixel definition layer, and in which an aperture part is formed to correspond to each of the first light-emitting element and the second light-emitting element, are formed on a base. A first interval between the reflective layer and the semi-transmissive reflective layer in the first light-emitting element and a second interval between the reflective layer and the semi-transmissive reflective layer in the second light-emitting element are different, and a film thickness of the pixel definition layer is less than a difference between the first interval and the second interval. |
申请公布号 |
US2015001558(A1) |
申请公布日期 |
2015.01.01 |
申请号 |
US201414314640 |
申请日期 |
2014.06.25 |
申请人 |
SEIKO EPSON CORPORATION |
发明人 |
NOZAWA Ryoichi;AMANO Atsushi;KOSHIHARA Takeshi;FUKASE Akio;IWATA Shinichi |
分类号 |
H01L27/15;H01L33/60 |
主分类号 |
H01L27/15 |
代理机构 |
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代理人 |
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主权项 |
1. A light-emitting device,
wherein a first light-emitting element and a second light-emitting element that have a resonance structure that causes output light from a light-emission functional layer to resonate between a reflective layer and a semi-transmissive reflective layer between which the light-emission functional layer is interposed, respectively, and a pixel definition layer that is formed of an insulating material, and in which an aperture part is formed to correspond to each of the first light-emitting element and the second light-emitting element are formed on a base, wherein a first interval between the reflective layer and the semi-transmissive reflective layer in the first light-emitting element and a second interval between the reflective layer and the semi-transmissive reflective layer in the second light-emitting element are different from each other, and wherein a film thickness of the pixel definition layer is less than a difference between the first interval and the second interval. |
地址 |
Tokyo JP |