PHOTOSENSITIVE RESIN COMPOSITION, CURED-FILM MANUFACTURING METHOD, CURED FILM, LIQUID-CRYSTAL DISPLAY, AND ORGANIC EL DISPLAY

摘要

This invention provides the following: a photosensitive resin composition that has a low relative permittivity, excels in terms of storage stability, and exhibits good chemical resistance when made into a cured film; a cured-film manufacturing method; a cured film; a liquid-crystal display; and an organic EL display. Said photosensitive resin composition contains a photoacid generator, a solvent, and a polymer component containing the following: (1) a polymer that has both (a1-1) a constitutional unit that has a group in which an acid group is protected by an acid-labile group and (a4) a constitutional unit that can be represented by general formula (S); and/or (2) both (a1-1) a polymer that has a constitutional unit that has a group in which an acid group is protected by an acid-labile group and (a4) a polymer that has a constitutional unit that can be represented by general formula (S). In general formula (S), R1 through R4 each independently represent a hydrogen atom or a substituent, with at least one of R1 through R4 representing a substituent; R5 represents a hydrogen atom or a methyl group; and L1 represents a single bond or a divalent linking group.