ABRASIVE, METHOD FOR PRODUCING ABRASIVE, AND POLISHING METHOD

摘要

The present invention addresses the problem of providing an abrasive containing abrasive particles which is highly producible, is appropriate for precision polishing, and is capable of maintaining the polishing speed of the initial polishing interval for a long time. This abrasive contains abrasive particles comprising: at least 81 mol% in total of one or more types of elements selected from cerium (Ce), lanthanum (La), praseodymium (Pr), neodymium (Nd), samarium (Sm), and europium (Eu); and no more than 19 mol% in total of yttrium (Y), gadolinium (Gd), terbium (Tb), dysprosium (Dy), holmium (Ho), erbium (Er), thulium (Tm), ytterbium (Yb), and lutetium (Lu). Furthermore, the abrasive is characterized in that the monodispersity of the particle diameter of the abrasive particles is 30% or less.