发明名称 |
CHEMICAL VAPOR DEPOSITION PROCESS FOR DEPOSITING A SILICA COATING ON A GLASS SUBSTRATE |
摘要 |
A CVD process for depositing a silica coating is provided. The process includes providing a glass substrate. The process also includes forming a gaseous mixture including a silane compound, oxygen, a fluorine-containing compound, and a radical scavenger such as ethylene or propylene. The gaseous mixture is directed toward and along the glass substrate and is reacted over the glass substrate to form the silica coating thereon. |
申请公布号 |
EP2817433(A1) |
申请公布日期 |
2014.12.31 |
申请号 |
EP20130705247 |
申请日期 |
2013.02.18 |
申请人 |
PILKINGTON GROUP LIMITED |
发明人 |
NELSON, DOUGLAS MARTIN;RADTKE, MICHAEL MARTIN;PHILLIPS, STEVEN EDWARD |
分类号 |
C23C16/40 |
主分类号 |
C23C16/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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