发明名称 SYSTEM AND METHOD FOR AUTOMATIC GAS OPTIMIZATION IN A TWO-CHAMBER GAS DISCHARGE LASER SYSTEM
摘要 A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser such as an excimer laser is disclosed. The laser is continuously fired at a low power output, and the gas in the amplifier laser chamber bled if necessary until the discharge voltage meets or exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased, and the gas bled again if necessary until the voltage and pressure meet or exceed the minimum values. The laser is then fired in a burst pattern that approximates the expected firing of the laser in operation, and the gas bled if necessary until the discharge voltage meets or exceeds the minimum value and the output energy meets or exceeds a minimum value, again without dropping the pressure in the chamber below the minimum value. Once the minimum values are provided, the process runs quickly without manual interaction.
申请公布号 EP2727199(A4) 申请公布日期 2014.12.31
申请号 EP20120803599 申请日期 2012.06.05
申请人 CYMER, LLC 发明人 O'BRIEN, KEVIN, M.;THORNES, JOSHUA, J.;RIGGS, DANIEL, J.;JIANG, RUI
分类号 H01S3/22;H01S3/036;H01S3/104;H01S3/225;H01S3/23 主分类号 H01S3/22
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