A CHEMICAL VAPOR DEVICE AND A CONTROL METHOD THEREOF

摘要

An objective of the present invention is to provide a chemical vapor deposition device capable of stably maintaining a position of a support belt to secure stability of a process, and a device and a method of controlling the same. The present invention provides the chemical vapor deposition device including: a process chamber wherein a deposition process is performed with respect to a flexible substrate; a support belt supporting the flexible substrate loaded into the process chamber; a support roller to support the support belt; a sensor disposed adjacent to the support belt to detect whether the support belt is away from a predetermined position; and a position adjustment unit connected to the support roller to move the support roller in accordance to the detection results of the sensor, thereby adjusting a position of the support belt.