PHOTOSENSITIVE RESIN COMPOSITION, CURED-FILM MANUFACTURING METHOD, CURED FILM, LIQUID-CRYSTAL DISPLAY, AND ORGANIC EL DISPLAY

摘要

The provision of the following: a photosensitive resin composition that has a low relative permittivity and exhibits good chemical resistance when made into a cured film; a cured-film manufacturing method; a cured film; a liquid-crystal display; and an organic EL display. Said photosensitive resin composition contains (S) a compound that can be represented by general formula (S), (B-1) a photoacid generator, (C-1) a solvent, and (A-1) a polymer component containing the following: (1) a polymer that has both (a1-1) a constitutional unit that has a group in which an acid group is protected by an acid-labile group and (a1-2) a constitutional unit that has a cross-linkable group; and/or (2) both (a1-1) a polymer that has a constitutional unit that has a group in which an acid group is protected by an acid-labile group and (a1-2) a polymer that has a constitutional unit that has a cross-linkable group. In general formula (S), R1 through R4 each independently represent a hydrogen atom or a substituent; X1 represents a hydrogen atom or a group including a reactive group; X2 represents a single bond or a group having a valence of (n1+1); and n1 represents an integer between 1 and 3, inclusive.