GAS SUPPLY UNIT AND THIN FILM DEPOSITION APPARATUS HAVING THE SAME

摘要

The present invention relates to a gas supply unit and a thin film deposition apparatus including the same. The gas supply unit according to the present invention includes: a housing which includes a processing gas supply channel in which processing gas moves therein; a diffusion member which is formed in the processing gas supply channel and diffuses the processing gas; a shower head which is formed on the lower side of the diffusion member and includes a plurality of through holes through which the processing gas passes; a fine path which is formed on the lower side of the shower head and in which the processing gas moves; and a processing gas guide unit which guides the spray direction of the processing gas supplied from the fine path.