| 摘要 |
A process of exposing a substrate to oxygen plasma while heating the substrate; and a cycle process, in which the substrate is exposed to an atmosphere of a mixture gas of a hydrogen fluoride gas and an alcohol gas, and a first period during which a total pressure of the mixture gas or a partial pressure of the alcohol gas is set to be a first total pressure or a partial pressure of the alcohol gas and a second period during which the total pressure of the mixture gas or the partial pressure of the alcohol gas is set to be a second total pressure lower than the first total pressure or a partial pressure of the alcohol gas lower than the partial pressure of the alcohol gas are repeated multiple cycles, are performed. In the cycle process, the mixture gas is supplied to the substrate from a region facing the substrate, and a supply amount of the mixture gas per a unit area from a circular first region including a central portion of the substrate is set to be larger than a supply amount of the mixture gas per a unit area from a second region outside the first region. |
