| 摘要 |
Provided is a practical photo-alignment technique which greatly improves the thickness uniformity of exposure by designing a transfer system. A beam from a light source (3) of a long light emitting part is emitted to a radiation region (R) through a polarized element unit (4). A transfer system (2) transfers a substrate (S) in a first direction and reciprocates it while it pass through the radiation region (R). The boundary line (40) of each polarized element (41) is in the first direction. The transfer system (2) transfers the substrate (S) in a second direction before the transfer of a double path, after the transfer of a reciprocating path. Seeing it from the substrate (S), the location of the boundary line (40) is changed. Therefore, exposure becomes uniform. |
