| 摘要 |
The invention relates to a method and an apparatus for providing one or more coating layers on a surface (3) of a substrate (1, 48) by successive surface reactions of at least a first and second precursor. The method comprises supplying the first precursor from a first precursor nozzle (2) and the second precursor from a second precursor nozzle (4) to the surface (3) of the substrate (1, 48) and moving the substrate (1, 48) relative to at least one of the first and second precursor nozzle (2, 4). The method further comprises subjecting only one or more first limited sub-areas (20, 21, 22) of the surface (3) of the substrate (1, 48) to the first and second precursor by co-operation of supplying the first and second precursor and simultaneously moving the substrate (3) relative to at least one of the first and second precursor nozzle (2, 4). |
