发明名称 MULTILAYER STRUCTURE AS REFLECTOR WITH INCREASED MECHANICAL STABILITY
摘要 The present invention relates to a multilayer structure as a reflector with increased mechanical stability, which comprises a substrate layer A, a barrier layer B, a metallic reflector layer C, an optional layer D, a plasma polymer layer E, and a covering layer comprising inorganic constituents, and the covering layer does not contain UV absorber.
申请公布号 EP2817149(A1) 申请公布日期 2014.12.31
申请号 EP20120813338 申请日期 2012.12.19
申请人 BAYER MATERIALSCIENCE AG 发明人 OSER, RAFAEL;KUHLMANN, TIMO
分类号 B32B17/10;C03C17/36 主分类号 B32B17/10
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