发明名称 RADIATION SOURCE FOR AN EUV OPTICAL LITHOGRAPHIC APPARATUS, AND LITHOGRAPHIC APPARATUS COMPRISING SUCH A RADIATION SOURCE
摘要 A radiation source generates extreme ultraviolet radiation. The radiation source comprises a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma. A receiving structure is provided to trap debris particles on its surface that are generated with the formation of the plasma. The receiving structure has a rod-shaped heater element for heating the receiving surface, the device preventing large droplets of fuel from forming on the receiving surface. Instead, the trapped fuel is melted off the receiving surface.
申请公布号 WO2014206706(A1) 申请公布日期 2014.12.31
申请号 WO2014EP61710 申请日期 2014.06.05
申请人 ASML NETHERLANDS B.V. 发明人 FRANKEN, JOHANNES
分类号 G03F7/20;H05G2/00 主分类号 G03F7/20
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