发明名称 THIN FILM TRANSISTOR
摘要 A thin film transistor (17) is provided with: a gate electrode (20); a gate insulating layer (21) which covers the gate electrode; a source electrode (30) and a drain electrode (40) which are provided on the gate insulating layer (21); and an organic semiconductor layer (50) which has a channel region (Ch1) between the source electrode and the drain electrode. The source electrode (30) and the drain electrode (40) comprise first conductive layers (31, 41) for increasing adhesion to the gate insulating layer (21), second conductive layers (32, 42) which have low electrical resistances, and third conductive layers (33, 43) which establish an ohmic contact with the organic semiconductor layer (50). The third conductive layers (33, 43) have first contact surfaces (33a, 43a) which are in contact with the gate insulating layer (21), and second contact surfaces (33b, 43b) which are in contact with lateral surfaces of the first conductive layers (31, 41) and lateral surfaces of the second conductive layers (32, 42), said lateral surfaces being on the channel region (Ch1) side.
申请公布号 WO2014208442(A1) 申请公布日期 2014.12.31
申请号 WO2014JP66267 申请日期 2014.06.19
申请人 SHARP KABUSHIKI KAISHA 发明人 FUKUSHIMA, YASUMORI
分类号 H01L29/786;H01L21/28;H01L29/41;H01L51/05 主分类号 H01L29/786
代理机构 代理人
主权项
地址