| 摘要 |
<p>Provided are an array substrate and a manufacturing method therefor, a display panel and a display device. The array substrate comprises a plurality of pixel units. Each pixel unit comprises a thin-film transistor area (Q1) and a display area (Q2), wherein a thin-film transistor is arranged in the thin-film transistor area (Q1), and the thin-film transistor comprises: a gate electrode (2), a gate insulating layer (3), a source electrode (601), a drain electrode (602) and an active area (401); and a pixel electrode (8) is provided in the display area (Q2). The manufacturing method for an array substrate comprises: forming a pattern which comprises a gate electrode (2) on a substrate (1) by means of a patterning process, and forming a gate insulating layer (3); on the substrate (1), on which the above step is completed, forming a pattern which comprises the active area (401) and an etching blocking area (5) provided on the active area (401) by means of the patterning process; forming a transparent conducting-layer thin film, and forming a pattern which comprises a source electrode (601) and a drain electrode (602) using the transparent conducting-layer thin film by means of the patterning process; and forming a pattern which comprises a pixel electrode (8) using the transparent conducting-layer thin film by means of the patterning process.</p> |
