| 摘要 |
This substrate processing method comprises: a polymer separation step wherein a block copolymer is phase separated into a hydrophilic polymer and a hydrophobic polymer; and a polymer removal step wherein the hydrophilic polymer is selectively removed from the phase separated block copolymer. In the polymer removal step, the hydrophilic polymer is removed by irradiating the phase separated block copolymer with an energy ray, then supplying a first polar organic solvent to the block copolymer, and next supplying a second polar organic solvent to the block copolymer. The first polar organic solvent has a first solubility for the hydrophilic polymer, has a lower boiling point than water, is soluble in water, and does not dissolve the hydrophobic polymer. The second polar organic solvent has a second solubility that is lower than the first solubility, has a higher boiling point than water, and does not dissolve the hydrophobic polymer. |
