| 发明名称 |
AQUEOUS, NITROGEN-FREE CLEANING COMPOSITION, PREPARATION AND USE THEREOF |
| 摘要 |
<p>Aqueous, nitrogen-free cleaning composition, preparation and use thereof are provided. The composition having a pH of from 5 to 8 comprises (A) an amphiphilic nonionic, water-soluble or water-dispersible surfactant and (B) a metal chelating agent selected from polycarboxylic acids having at least 3 carboxylic acid groups. The composition is used for removing residues and contaminants from semiconductor substrates.</p> |
| 申请公布号 |
EP2688688(A4) |
申请公布日期 |
2014.12.31 |
| 申请号 |
EP20120760859 |
申请日期 |
2012.02.28 |
| 申请人 |
BASF SE |
发明人 |
KLIPP, ANDREAS;RAMAN, VIJAY IMMANUEL;VENKATARAMAN, SHYAM SUNDAR;MELLIES, RAIMUND;ZHONG, MINGJIE |
| 分类号 |
H01L21/02;C11D1/72;C11D1/825;C11D3/20;C11D11/00;H01L21/306 |
主分类号 |
H01L21/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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