Modulation device and charged particle multi-beamlet lithography system using the same

摘要

The invention relates to a charged-particle multi-beamlet lithography system. The system comprises a beam generator for generating a plurality of beamlets, a beamlet blanker array for patterning the plurality of beamlets, an optical fiber arrangement, and a projection system. The beamlet blanker array comprises a substrate provided with a first area comprising one or more modulators and a second area free of modulators. The beamlet blanker array comprises one or more light sensitive elements, electrically connected to the one or more modulators, and arranged to receive light beams carrying pattern data. The optical fiber arrangement comprises a plurality of optical fibers for guiding the light beams carrying pattern data towards the one or more light sensitive elements. The projection of the optical fiber arrangement onto a surface of the beamlet blanker array in a direction perpendicular to the surface falls entirely within the second area.

主权项

1. A charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target using a plurality of charged particle beamlets, the system comprising:
a beam generator for generating a plurality of charged particle beamlets; a beamlet blanker array for patterning the plurality of beamlets in accordance with a pattern, the beamlet blanker array comprising a substrate provided with a first area comprising one or more modulators for modulating the beamlets on the basis of pattern data related to the pattern to be formed onto the surface and a second area free of modulators and comprising one or more light sensitive elements, the one or more light sensitive elements being electrically connected to the one or more modulators and being arranged to receive light beams carrying the pattern data and to provide the received pattern data to the one or more modulators; an optical fiber arrangement for guiding the light beams carrying the pattern data, during operation of the lithography system, towards the one or more light sensitive elements, the optical fiber arrangement comprising a plurality of optical fibers; and a projection system for projecting the patterned beamlets onto the target surface;wherein a projection of the optical fibers in the optical fiber arrangement in a direction perpendicular to the beamlet blanker array surface falls entirely within the second area.