High efficiency gas dissociation in inductively coupled plasma reactor with improved uniformity

摘要

Embodiments of the present invention relate to a plasma chamber having a coil assembly which improves plasma uniformity and improves power coupling to the plasma. One embodiment provides a plasma chamber. The plasma chamber includes a chamber body having sidewalls and a lid, wherein the chamber body defines a processing volume. The plasma chamber further includes a coil assembly disposed over the lid configured to generate inductively coupled plasma within the processing volume, wherein the coil assembly comprises two or more horizontal coils arranged in a common horizontal plane.

主权项

1. A plasma chamber, comprising:
a chamber body having sidewalls and a lid, wherein the chamber body defines a processing volume; a coil assembly disposed over the lid configured to generate inductively coupled plasma within the processing volume, wherein the coil assembly comprises:
two or more horizontal coils arranged in a common horizontal plane; andan inner coil disposed radially inward of the two or more horizontal coils, wherein the inner coil is a helical coil, the inner coil and the two or more horizontal coils are connected in parallel; a chamber extension disposed within the inner coil near a center of the lid, wherein the chamber extension defines an extension volume; and a nozzle disposed between the processing volume and the extension volume, wherein the nozzle directs one or more processing gases into the processing volume through the extension volume.