发明名称 Apparatus comprising substrate and conductive layer
摘要 A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed.
申请公布号 US8920153(B2) 申请公布日期 2014.12.30
申请号 US201314016226 申请日期 2013.09.03
申请人 Seagate Technology LLC 发明人 Kim Hae-sung;Ko Hyoung-soo;Hong Seung-bum;Sohn Jin-seung;Choa Sung-hoon;Lim Chee-kheng
分类号 B29C59/00;B82Y10/00;G03F1/00;G03F7/00;B82Y40/00 主分类号 B29C59/00
代理机构 代理人
主权项 1. An apparatus comprising: a light-transmitting substrate; a silicon oxide or silicon nitride layer comprising patterns, formed on the substrate; and a conductive layer implanted in the silicon oxide or silicon nitride layer.
地址 Cupertino CA US