发明名称 |
Apparatus comprising substrate and conductive layer |
摘要 |
A nano imprint master and a method of manufacturing the same are provided. The method includes: implanting conductive metal ions into a substrate including quartz to form a conductive layer inside the quartz substrate; coating a resist on the quartz substrate in which the conductive layer is formed, to form a resist coating layer; exposing the resist coating layer to an electron beam to form micropatterns; etching the quartz substrate by using the resist coating layer, in which the micropatterns are formed, as a mask; and removing the resist coating layer to obtain a master in which micropatterns are formed. |
申请公布号 |
US8920153(B2) |
申请公布日期 |
2014.12.30 |
申请号 |
US201314016226 |
申请日期 |
2013.09.03 |
申请人 |
Seagate Technology LLC |
发明人 |
Kim Hae-sung;Ko Hyoung-soo;Hong Seung-bum;Sohn Jin-seung;Choa Sung-hoon;Lim Chee-kheng |
分类号 |
B29C59/00;B82Y10/00;G03F1/00;G03F7/00;B82Y40/00 |
主分类号 |
B29C59/00 |
代理机构 |
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代理人 |
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主权项 |
1. An apparatus comprising:
a light-transmitting substrate; a silicon oxide or silicon nitride layer comprising patterns, formed on the substrate; and a conductive layer implanted in the silicon oxide or silicon nitride layer. |
地址 |
Cupertino CA US |