发明名称 |
Process for forming an aramid copolymer |
摘要 |
The invention concerns processes for forming polymer crumb comprising residues of 2-(4-amino phenyl)-5(6)amino benzimidazole (DAPBI), paraphenylene diamine (PPD), and terephthaloyl dichloride, comprising the steps of: (a) forming a slurry of b mole percent DAPBI and y mole percent PPD in a solvent system comprising organic solvent and c weight percent of an inorganic salt, wherein the inorganic salt is present in an amount of at least 5 weight percent of the organic solvent, DAPBI and PPD being present in an amount sufficient for providing a polymer solution having a weight percent solids of 12 percent or greater on a polymer basis; and (b) contacting the slurry of step a) with a stoichiometric amount of terephthaloyl dichloride to form a product comprising the polymer; wherein the sum of y+b is 100 and the product of b×c is 225 or greater. |
申请公布号 |
US8921512(B2) |
申请公布日期 |
2014.12.30 |
申请号 |
US201213559659 |
申请日期 |
2012.07.27 |
申请人 |
E I du Pont de Nemours and Company |
发明人 |
Mallon Frederick K |
分类号 |
C08G73/00;C08G69/00;C08G73/18;C08G69/28;C08G69/32 |
主分类号 |
C08G73/00 |
代理机构 |
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代理人 |
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主权项 |
1. A process for forming a polymer crumb comprising residues of 2-(4-amino phenyl)-5(6) amino phenyl benzimidazole (DAPBI), paraphenylene diamine (PPD), and terephthaloyl dichloride, comprising the steps of:
a) forming a slurry of b mole percent DAPBI and y mole percent PPD in a solvent system comprising organic solvent and c weight percent of an inorganic salt, wherein the inorganic salt is present in an amount of at least 5 weight percent of the organic solvent, DAPBI and PPD being present in an amount sufficient for providing a polymer solution having a weight percent solids of 12 percent or greater on a polymer basis; and b) contacting the slurry of step a) with a stoichiometric amount of terephthaloyl dichloride to form a product comprising said polymer wherein the sum of y+b is 100 and the product of b×c is 225 or greater; wherein the weight percent solids in the product is 14-25% on a monomer basis. |
地址 |
Wilmington DE US |