| 摘要 |
A sintered compact sputtering target configured from an alloy having a composition comprising Pt at a molecular ratio of 35 to 55% and remainder being Fe, and a nonmagnetic substance dispersed in the alloy, wherein the nonmagnetic substance contains at least SiO2, SiO2 is amorphous, and a residual oxygen amount, which is obtained by subtracting an amount of oxygen contained as a constituent of the nonmagnetic substance from a total amount of oxygen contained in the target, is 0.07 wt % or less. An object of this invention is to provide a sintered compact sputtering target having a structure in which a nonmagnetic substance containing SiO2 is dispersed in an Fe—Pt-based alloy and capable of suppressing the crystallization of SiO2 into cristobalite, and reducing the amount of particles that is generated during sputtering. |
