| 发明名称 | Photosensitive polysiloxane composition and applications thereof | ||
| 摘要 | A photosensitive polysiloxane composition for forming a protective film having superior sensitivity is disclosed. A protective film formed from the photosensitive polysiloxane composition and an element including the protective film are also disclosed. The photosensitive polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonic acid ester, a urethane(meth)acrylate compound having at least six (meth)acryloyl groups in a molecule, and a solvent. | ||
| 申请公布号 | US8921024(B2) | 申请公布日期 | 2014.12.30 |
| 申请号 | US201314098763 | 申请日期 | 2013.12.06 |
| 申请人 | Chi Mei Corporation | 发明人 | Wu Ming-Ju;Shih Chun-An |
| 分类号 | G03F7/023;G03F7/027;G03F7/075;G03F7/038 | 主分类号 | G03F7/023 |
| 代理机构 | Jianq Chyun IP Office | 代理人 | Jianq Chyun IP Office |
| 主权项 | 1. A photosensitive polysiloxane composition, comprising: a polysiloxane, an o-naphthoquinonediazidesulfonic acid ester, a urethane (meth)acrylate compound having at least six (meth)acryloyl groups in a molecule, and a solvent. | ||
| 地址 | Tainan TW | ||