| 发明名称 |
LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE MEDIUM |
| 摘要 |
<p>Disclosed is a liquid processing method which may de-electrify the surface of a hydrophobized substrate. A substrate electrified by a liquid processing is de-electrified by supplying hydrophobizing liquid to the surface of a substrate (W) subjected to the liquid processing while rotating the substrate (W) for hydrophobizing the surface of the substrate, and performing rinsing by supplying alkaline rinsing liquid to the hydrophobized surface of the substrate (W).</p> |
| 申请公布号 |
KR20140147716(A) |
申请公布日期 |
2014.12.30 |
| 申请号 |
KR20140073526 |
申请日期 |
2014.06.17 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
HACHIYA YOSUKE;KAWANO HISASHI;NAKAMORI MITSUNORI;NONAKA JUN;MIZOTA SHOGO;NAGAMATSU TATSUYA;SAIKI DAISUKE;TERAOKA KAZUHIRO;YABUTA TAKASHI |
| 分类号 |
H01L21/302;H01L21/02;H01L21/08 |
主分类号 |
H01L21/302 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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