| 摘要 |
<p>The present invention relates to an air gap forming method using an amorphous carbon layer comprising: a first deposition step of depositing an amorphous carbon layer on metal wire pattern formed on a substrate, wherein the amorphous carbon layer is conformal on the pattern; a second deposition step of forming an air gap inside the amorphous carbon layer by closing an opening on the upper part of the pattern by depositing an additional amorphous carbon layer on the deposited conformal amorphous carbon layer; and a third depositing step of depositing amorphous carbon layer on the amorphous carbon layer having the air gap at a higher deposition speed, wherein the amorphous carbon layer is deposited in multiple steps having different depositing speeds, and the deposition speeds are configured to change to increase a deposition rate. As a result, an air gap can be formed in an amorphous carbon layer using the amorphous carbon layer deposited on a substrate, and permittivity can be lowered, and an amorphous carbon layer can be used as a hard mask, and damage to an air gap can be prevented during a process without a separate consolidation process, and the penetration of a metal substance of a metal wire can be effectively prevented by adding a precursor containing nitrogen when an amorphous carbon layer is deposited, and adhesive performance between an amorphous carbon layer and a metal can be improved.</p> |
