发明名称 Method of preparing lithographic printing plate and developer for lithographic printing plate precursor
摘要 By a method of preparing a lithographic printing plate having exposing a lithographic printing plate precursor including a photosensitive layer containing (A) a polymerization initiator, (B) a polymerizable compound, (C) a sensitizing dye and (D) a binder polymer and a protective layer in this order on a hydrophilic support with laser and then removing the protective layer and an unexposed area of the photosensitive layer in the presence of a developer, in which the developer is a developer which has pH of from 2 to less than 10 and contains an amphoteric surfactant and a nonionic surfactant having an alkylene oxide chain, a simple processing of one solution and one step which does not require a water washing step becomes possible, excellent development property is achieved and a lithographic printing plate which has good printing durability and does not cause printing stain can be provided.
申请公布号 US8921033(B2) 申请公布日期 2014.12.30
申请号 US201113581040 申请日期 2011.02.22
申请人 FUJIFILM Corporation 发明人 Inno Toshifumi
分类号 G03F7/00;G03F7/26;B41M1/00;B41N1/00;G03F7/32 主分类号 G03F7/00
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. A method of preparing a lithographic printing plate comprising: exposing a lithographic printing plate precursor comprising a photosensitive layer containing (A) a polymerization initiator, (B) a polymerizable compound, (C) a sensitizing dye and (D) a binder polymer and a protective layer in this order on a hydrophilic support with laser; and then removing the protective layer and an unexposed area of the photosensitive layer in the presence of a developer, wherein: the developer is a developer which has pH of from 2 to less than 10 and contains an amphoteric surfactant and a nonionic surfactant having an alkylene oxide chain; the amphoteric surfactant is at least one amphoteric surfactant represented by the following formula (1) or (2):wherein, in the formula (1), R1 represents an alkyl group having from 8 to 20 carbon atoms or an alkyl group having a connecting group which has from 8 to 20 carbon atoms in total, R2 and R3 each independently represents an alkyl group or a group containing an ethyleneoxide group, R4 represents a single bond or an alkylene group, and two groups of R1, R2, R3 and R4 may be combined with each other to form a ring structure; and in the formula (2), R11 represents an alkyl group having from 8 to 20 carbon atoms or an alkyl group having a connecting group which has from 8 to 20 carbon atoms in total, R12 and R13 each independently represents a hydrogen atom, an alkyl group or a group containing an ethyleneoxide group, R14 represents a single bond or an alkylene group, and two groups of R11 , R12 , R13 and R14 may be combined with each other to form a ring structure; and the nonionic surfactant having an alkylene oxide chain is at least one nonionic aromatic ether surfactant represented by the following formula (3): X—Y—O-(A)n-(B)m—H  (3) wherein, in the formula (3), X represents an aromatic group, Y represents single bond or an alkylene group having from 1 to 10 carbon atoms, A and B, which are different from each other, each represents —CH2CH2O— or —CH2CH(CH3)O—, and n and m each represents an integer from 0 to 100, provided that the sum of n and m is 2 or more.
地址 Tokyo JP
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