发明名称 RADIATION SOURCE
摘要 A radiation source for generating EUV radiation includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets, which may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a collector. The tin droplets may be pre-conditioned by a laser pre-pulse before the main laser pulse to change the shape of the droplets so that the droplets are in an optimum condition for receiving the main laser pulse. Embodiments of the invention take into account the effect of the vaporization of one fuel droplet on succeeding droplets and allow the timing of the main and/or pre-pulse to be adjusted to take into account any delay in arrival of the subsequent droplet or oscillations in the shape of the subsequent droplet which may be caused by vaporization of the preceding droplet.
申请公布号 SG11201407262V(A) 申请公布日期 2014.12.30
申请号 SG11201407262V 申请日期 2013.04.29
申请人 ASML NETHERLANDS B.V. 发明人 VAN SCHOOT, JAN;KEMPEN, ANTONIUS;KREUWEL, HERMANUS;YAKUNIN, ANDREI, MIKHAILOVICH
分类号 H05G2/00 主分类号 H05G2/00
代理机构 代理人
主权项
地址