COMPOSITION FOR FORMING NEUTRAL LAYER AND METHOD FOR FORMING DIRECTED SELF ASSEMBLY RESIST PATTERN USING THE SAME

摘要

The present invention relates to a composition for forming a neutral layer capable of a self-assembly resist pattern directed by selectively exposing a neutral layer without forming a guide pattern, and to a method for forming a directed self-assembly resist pattern using the same. The composition for forming a neutral layer comprises polymers including a repeating unit represented by chemical formula 1; an acid generator; a cross-linking agent; and a solvent. In chemical formula 1, R_1 is a hydrogen atom or a methyl group, x and y are mole% of respective repeating units forming the polymers, x is 40-90 mole%, and y is 10-60 mole%.