发明名称 METHOD FOR MANUFACTURING PHASE-SHIFT PLATE
摘要 <p>A retardation plate manufacturing method for manufacturing a retardation plate that has an orientation pattern in which is formed a plurality of regions having optical axes oriented in different directions from each other, the retardation plate manufacturing method comprising arranging an unoriented light orientation layer that is to be oriented by light on a first surface of a substrate; preparing a retardation mask including an orientation pattern in which is formed a plurality of regions that have a quarter wavelength retardation plate retardation function and correspond to the plurality of regions in the orientation pattern of the retardation plate; and orienting the light orientation layer by irradiating the retardation mask with elliptically polarized light and irradiating the light orientation layer with polarized light emitted form the retardation mask.</p>
申请公布号 KR20140146584(A) 申请公布日期 2014.12.26
申请号 KR20147025189 申请日期 2013.02.27
申请人 ARISAWA MFG. CO., LTD. 发明人 KAKUBARI YUICHI;WATABE KENICHI
分类号 G02B5/30;G02F1/1337 主分类号 G02B5/30
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