METHOD FOR COMPENSATING BEAM PATTERNING DIRECTION AND POSITION

摘要

The present invention relates to a method to correct a patterning position and a beam patterning direction. More specifically, the said invention relates to a method to correct the position and direction of a beam patterning capable of making a specific pattern on a substrate by patterning a beam in case of a substrate deformation. According to an embodiment of the present invention, the method to correct a patterning position and a beam patterning direction comprises: a step of loading a substrate inside a process chamber; a step of generating a virtual undeformed substrate model based on undeformed substrate shape information showing a shape of the undeformed substrate, which is a substrate before the substrate is deformed; a step of generating a virtual deformed substrate model by determining the deformation amount of the substrate loaded into the process chamber; a step of calculating a patterning sector start point which is the center point of a patterning sector start side, and a patterning sector end point which is the center point of a patterning sector end side where patterning of a beam is performed by each sector in the deformed substrate model using the undeformed substrate shape information; and a step of determining a patterning start substrate position by sector by considering a slope between the patterning sector start point and the patterning sector end point.