发明名称 SYSTEM FOR PRIMARY RAY SHOOTING HAVING GEOMETRICAL STENCILS
摘要 Aspects comprise ray shooting system based on the data structure of a uniform grid of cells, and on local stencils in cells. The high traversal and construction costs of accelerating structures are cut down. The object's visibility from the viewpoint and from light sources, as well as the primary workload and its distribution among cells, are gained in the preprocessing stage and cached in stencils for runtime use. In runtime, the use of stencils allows a complete locality at each cell, for load balanced parallel processing.
申请公布号 US2014375643(A1) 申请公布日期 2014.12.25
申请号 US201414479326 申请日期 2014.09.07
申请人 Bakalash Reuven 发明人 Bakalash Reuven
分类号 G06T15/06;G06T15/60 主分类号 G06T15/06
代理机构 代理人
主权项 1. A ray tracing system having stencil based primary ray shooting, comprising: one or more processors with memory, a data structure of a scene, based on a grid of cells, wherein stencils are generated in data filled cells prior to primary ray shooting, while during the primary ray shooting local ray segments are generated in cells for only those shooting rays that hit the cell stencils, and intersection tests are conducted between said local ray segments and between local objects, generating primary intersection points.
地址 Shdema IL