发明名称 RAY SHADOWING SYSTEM UTILIZING GEOMETRICAL STENCILS
摘要 Aspects comprise ray tracing shadowing system based on the data structure of a uniform grid of cells, and on local stencils in cells. The high traversal and construction costs of accelerating structures are cut down. The object's visibility from the viewpoint and from light sources, as well as the primary workload and its distribution among cells, are gained in the preprocessing stage and cached in stencils for runtime use. In runtime, the use of stencils allows a complete locality at each cell, for load balanced parallel processing.
申请公布号 US2014375642(A1) 申请公布日期 2014.12.25
申请号 US201414479324 申请日期 2014.09.07
申请人 Bakalash Reuven 发明人 Bakalash Reuven
分类号 G06T15/60;G06T15/06 主分类号 G06T15/60
代理机构 代理人
主权项 1. A ray tracing system having stencil based shadowing, comprising: one or more processors with memory, a data structure of a scene, based on a grid of cells, wherein shadow stencils in data filled cells are generated by casting non-local obstructing objects in the light of a light source, then local segments of shadow rays are generated based on primary intersection points, and said local segments are tested for a hit with shadow stencil, wherein primary intersection points whose local segments hit the shadow stencil are shadowed, and segments that miss the shadow stencil are further tested for intersection with local obscuring objects.
地址 Shdema IL