发明名称 |
FABRICATING A CONDUCTIVE TRACE STRUCTURE AND SUBSTRATE HAVING THE STRUCTURE |
摘要 |
A method for fabricating a conductive trace structure includes the steps: forming a first metal layer on a non-conductive substrate; removing a part of the first metal layer to expose the non-conductive substrate so as to form the first metal layer into a plating region and a non-plating region, the plating region being divided into at least two trace-forming portions and at least one bridge portion; forming a second metal layer on the plating region by electroplating the plating region using one of the trace-forming portions and the bridge portion as an electrode; and removing the bridge portion and the second metal layer formed on the bridge portion. |
申请公布号 |
US2014374141(A1) |
申请公布日期 |
2014.12.25 |
申请号 |
US201214345352 |
申请日期 |
2012.11.27 |
申请人 |
Taiwan Green Point Enterprises Co., Ltd. ;Jabil Circuit Inc. |
发明人 |
Yi Sheng-Hung;Liao Pen-Yi;Chen Min-Hsiang |
分类号 |
H05K3/02;H05K3/18;H05K1/02 |
主分类号 |
H05K3/02 |
代理机构 |
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代理人 |
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主权项 |
1. A method for fabricating a conductive trace structure, comprising the steps:
forming a first metal layer on a non-conductive substrate; removing a part of the first metal layer to expose the non-conductive substrate so as to form the first metal layer into a plating region and a non-plating region separated from the plating region by the exposed non-conductive substrate, the plating region being divided into at least two trace-forming portions and at least one bridge portion interconnecting the trace-forming portions; forming a second metal layer on the plating region by electroplating the plating region using one of the trace-forming portions and the bridge portion as an electrode; and removing the bridge portion of the first metal layer and the second metal layer formed on the bridge portion. |
地址 |
Taichung City, TW |