SUPERCONDUCTIVE TRACE PATTERNS

摘要

A trace is disclosed formed of superconductive material. The trace is formed in an elongate, non-linear trace pattern characterized by (i) a trace pattern thickness, (ii) a trace pattern width greater than the trace pattern thickness, (iii) a trace pattern length greater than the trace pattern width, and (iv) a trace pattern axis extending along the trace length and defining an instantaneous alignment tangential to the trace pattern axis. The trace pattern is further characterized by (i) a envelope within which the trace pattern lies and (ii) an envelope axis defining an alignment of the envelope. The trace comprises at least two electrically connected sections, where each section includes (i) a first turn in which the trace pattern instantaneous alignment rotates about 180 degrees in a first direction around a first turn focus, and (ii) a second turn in which the trace pattern instantaneous alignment rotates about 180 degrees in a second direction, opposite the first direction, about a second turn focus. The turn radius is less than about 1,000 microns.

主权项

1. A trace comprised of superconductive material,
the trace having an elongate, non-linear trace pattern characterized by (i) a trace pattern thickness, (ii) a trace pattern width greater than the trace pattern thickness, (iii) a trace pattern length greater than the trace pattern width, (iv) a trace pattern axis extending along the trace length, and (v) an instantaneous alignment tangential to the trace pattern axis; said trace pattern further characterized by (i) an envelope within which the trace pattern oscillates and (ii) an envelope axis extending along a centerline of the envelope; said trace comprising at least two electrically continuous sections, where each section includes (i) a first turn in which the trace pattern instantaneous alignment changes about 180 degrees in a first direction around a first turn focus, and (ii) a second turn in which the trace pattern instantaneous alignment changes about 180 degrees in a second direction, opposite the first direction, about a second turn focus, and wherein a turn radius is less than about 1000 microns.