发明名称 |
POLISHING PAD |
摘要 |
The purpose of the present invention is to provide: a polishing pad which has improved dressing properties, while maintaining the hardness; or a polishing pad which does not easily make a scratch on the surface of an object to be polished, while having improved dressing properties. A polishing pad of the present invention is characterized by having a polishing layer that is formed of a polyurethane resin foam or an unfoamed polyurethane resin, and is also characterized in that the polyurethane resin foam or the unfoamed polyurethane resin contains, as starting material components, (A) an isocyanate component, (B) a polyol component and (C) an aromatic compound that has one hydroxyl group and/or an aromatic compound that has one amino group. |
申请公布号 |
US2014378031(A1) |
申请公布日期 |
2014.12.25 |
申请号 |
US201214345195 |
申请日期 |
2012.08.24 |
申请人 |
Sato Akinori;Doura Masato |
发明人 |
Sato Akinori;Doura Masato |
分类号 |
B24B37/24;C08G18/32;C08G18/76;H01L21/304;B24B37/04 |
主分类号 |
B24B37/24 |
代理机构 |
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代理人 |
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主权项 |
1. A polishing pad comprising a polishing layer that is formed of a polyurethane resin foam having closed cells, wherein the polyurethane resin foam contains, as starting material components, (A) an isocyanate component, (B) a polyol component, and (C) an aromatic compound having one hydroxyl group and/or an aromatic compound having one amino group. |
地址 |
Osaka JP |