发明名称 |
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE CONVEYING APPARATUS FOR USE IN THE SAME |
摘要 |
A substrate processing apparatus includes a substrate processing section that processes a plurality of substrates assuming a vertical posture in a batch manner; a first traversing mechanism that laterally moves a first traverse holding portion along a first traversing path between a substrate transfer position and a substrate delivery position; a second traversing mechanism that laterally moves a second traverse holding portion along a second traversing path disposed below the first traversing path between the substrate transfer position and the substrate delivery position; an elevation mechanism that raises and lowers an elevation holding portion in the substrate transfer position; and a main transfer mechanism that conveys a plurality of substrates assuming a vertical posture in a batch manner between the substrate delivery position and the substrate processing section, the first and second traverse holding portions, and the elevation holding portion each holds a plurality of substrates assuming a vertical posture in a batch manner. |
申请公布号 |
US2014377044(A1) |
申请公布日期 |
2014.12.25 |
申请号 |
US201414482656 |
申请日期 |
2014.09.10 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
MITSUYOSHI Ichiro;MURAMOTO Ryo |
分类号 |
B65G59/02;B65G25/04 |
主分类号 |
B65G59/02 |
代理机构 |
|
代理人 |
|
主权项 |
1. A substrate conveying apparatus, comprising:
a batch hand that holds a plurality of substrates assuming a horizontal posture piled together in a batch manner; a batch-hand advancing-retreating mechanism that advances and retreats the batch hand; a one-by-one hand that holds a single substrate assuming a horizontal posture; a one-by-one-hand advancing-retreating mechanism that advances and retreats the one-by-one hand, independently of movement of the batch hand; a holding base that holds the batch-hand advancing-retreating mechanism and the one-by-one-hand advancing-retreating mechanism; an elevation mechanism that moves the holding base upwardly and downwardly; and a rotation mechanism that rotates the holding base around a rotation axis line extending in a vertical direction while at least one of said batch hand and said one-by-one hand is holding a corresponding plurality of substrates or a single substrate, said substrates or substrate assuming a horizontal posture. |
地址 |
Kyoto JP |