| 摘要 |
PROBLEM TO BE SOLVED: To perform plasma treatment with less damage with plasma of a low plasma potential and a more stabilized high density.SOLUTION: A plasma treatment device comprises: a planar antenna element 142 which is disposed via a tabular dielectric 104 while opposing a mounting table within a treatment chamber 102; and a shield member 160 covering the antenna element. The antenna element is in a planar eddy coil shape wound around a center axis of the tabular dielectric. Both ends are opened and a midpoint of a length in a direction of winding is defined as a ground point. Within the treatment chamber, doughnut-shaped plasma is generated by resonating the antenna element with a 1/2 wavelength of a high frequency in such a manner that electrical lengths of a portion wound inside of the ground point and a portion wound outside of the ground point become equal by adjusting a distance between the antenna element and the shield member and adjusting stray capacitance between them. Plasma treatment is then applied to a substrate to be treated on the mounting table. |
