SUBSTRATE PREPARATION FOR SELECTIVE AREA DEPOSITION

摘要

A method of producing a patterned inorganic thin film element includes providing a substrate having a patterned thin layer of polymeric inhibitor on the surface. The substrate and the patterned thin layer of polymeric inhibitor are exposed to a highly reactive oxygen process. An inorganic thin film layer is deposited on the substrate in areas without inhibitor using an atomic layer deposition process.

主权项

1. A method of producing a patterned thin film element comprising:
providing a substrate having a patterned layer of polymeric inhibitor on the surface thereof; exposing the substrate and the patterned layer of polymeric inhibitor to a highly reactive oxygen process, the polymeric inhibitor retaining its ability to inhibit growth after being exposed to the highly reactive oxygen process; and depositing an inorganic thin film layer on the substrate using an atomic layer deposition process to form a patterned inorganic thin film layer on the substrate in areas without the polymeric inhibitor.