发明名称 APPARATUS FOR MONITORING DEPOSITION RATE, APPARATUS PROVIDED WITH THE SAME FOR DEPOSITING ORGANIC LAYER, METHOD OF MONITORING DEPOSITION RATE, AND METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY APPARATUS USING THE SAME
摘要 An apparatus for monitoring deposition rate, an apparatus including the same, for depositing an organic layer, a method of monitoring deposition rate, and a method of manufacturing an organic light emitting display apparatus using the same, are provided. The deposition rate monitoring apparatus for measuring deposition rate of a deposition material discharged from a deposition source, includes: a light source for irradiating light having a wavelength within a photoexcitation bandwidth of the deposition material; a first optical system for irradiating the light emitted from the light source toward the discharged deposition material; a second optical system for collecting the light emitted from the deposition material; and a first light sensor for detecting the amount of the light which is emitted from the deposition material and collected in the second optical system.
申请公布号 US2014377890(A1) 申请公布日期 2014.12.25
申请号 US201314079522 申请日期 2013.11.13
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 Voronov Alexander;Maslov Dmitry;Han Gyoo-Wan
分类号 H01L51/00;G01N21/64 主分类号 H01L51/00
代理机构 代理人
主权项 1. A deposition rate monitoring apparatus for measuring deposition rate of a deposition material discharged from a deposition source, comprising: a light source configured to irradiate light having a wavelength within a photoexcitation bandwidth of the deposition material; a first optical system configured to irradiate the light emitted from the light source toward the discharged deposition material; a second optical system configured to collect the light emitted from the deposition material; and a first light sensor configured to detect an amount of the light which is emitted from the deposition material and collected in the second optical system.
地址 Yongin-City KR
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