| 摘要 |
PROBLEM TO BE SOLVED: To reduce image distortion due to temperature gradients in a substrate and immersion liquid in an immersion projection exposure apparatus.SOLUTION: An immersion lithography apparatus comprises a temperature controller for adjusting temperature of a member in a final stage of a projection exposure apparatus PL, a substrate, and immersion liquid to common target temperature T4. Image forming consistency and whole performance can be improved, by adjusting all of the temperature of these structural members and by reducing temperature gradients. Means used to adjust the temperature may include controlling a flow rate and the temperature of the immersion liquid via a feedback circuit. |
