| 发明名称 |
ABSORBING REFLECTOR FOR SEMICONDUCTOR PROCESSING CHAMBER |
| 摘要 |
Embodiments of the disclosure generally relate to a reflector for use in a thermal processing chamber. In one embodiment, the thermal processing chamber generally includes an upper dome, a lower dome opposing the upper dome, the upper dome and the lower dome defining an internal volume of the processing chamber, a substrate support disposed within the internal volume, and a reflector positioned above and proximate to the upper dome, wherein the reflector has a heat absorptive coating layer deposited on a side of the reflector facing the substrate support. |
| 申请公布号 |
US2014376898(A1) |
申请公布日期 |
2014.12.25 |
| 申请号 |
US201414258410 |
申请日期 |
2014.04.22 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
Lo Kin Pong;Brillhart Paul;Ramachandran Balasubramanian;Kuppurao Satheesh;Redfield Daniel;Ranish Joseph M.;Mack James Francis;Patalay Kailash Kiran;Olsen Michael;Feigel Eddie;Halpin Richard;Vetorino Brett |
| 分类号 |
H05B3/00;H01L21/67 |
主分类号 |
H05B3/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A reflector for use in a thermal processing chamber, comprising:
a body having a top surface, a bottom surface opposing the top surface, a cooling channel formed in the body; and a heat absorptive coating layer deposited over at least a portion of the bottom surface. |
| 地址 |
Santa Clara CA US |
