Extreme Ultraviolet Lithography Mask and Multilayer Deposition Method for Fabricating Same

摘要

A mask, method of fabricating same, and method of using same are disclosed. In an example, a mask includes a substrate and a reflective multilayer coating deposited over the substrate. The reflective multilayer coating is formed by positioning the substrate such that an angle α is formed between a normal line of the substrate and particles landing on the substrate and rotating the substrate about an axis that is parallel with a landing direction of the particles. In an example, reflective multilayer coating includes a first layer and a second layer deposited over the first layer. A phase defect region of the reflective multilayer coating includes a first deformation in the first layer at a first location, and a second deformation in the second layer at a second location, the second location laterally displaced from the first location.

主权项

1. A method for forming at least a reflective layer over a substrate, the method comprising:
tilting the substrate; rotating the substrate; depositing a first layer; depositing a second layer; and wherein the substrate is tilted and rotated during the depositing of the first and the second layers such that a lateral location of a deformation in the second layer is displaced by a distance from a lateral location of a deformation in the first layer.