发明名称 BI-DIRECTIONAL GALLIUM NITRIDE SWITCH WITH SELF-MANAGED SUBSTRATE BIAS
摘要 A semiconductor device includes a bidirectional GaN FET formed on a non-insulating substrate. The semiconductor device further includes a first electrical clamp connected between the substrate and a first source/drain node of the bidirectional GaN FET, and a second electrical clamp connected between the substrate and a second source/drain node of the bidirectional GaN FET. The first clamp and the second clamp are configured to bias the substrate at a lower voltage level of an applied bias to the first source/drain node and an applied bias to the second source/drain node, within an offset voltage of the relevant clamp.
申请公布号 US2014374766(A1) 申请公布日期 2014.12.25
申请号 US201313922352 申请日期 2013.06.20
申请人 Texas Instruments Incorporated 发明人 BAHL Sandeep R.;SENESKY Matthew;TIPIRNENI Naveen;ANDERSON David I.;PENDHARKAR Sameer
分类号 H01L27/06;H01L29/20 主分类号 H01L27/06
代理机构 代理人
主权项 1. A semiconductor device, comprising: a bidirectional gallium nitride field effect transistor (GaN FET) formed on III-N layers over a substrate, said substrate being non-insulating, said bidirectional GaN FET having a first source/drain node and a second source/drain node; a first clamp connected between said first source/drain node and said substrate; and a second clamp connected between said second source/drain node and said substrate.
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