发明名称 |
BI-DIRECTIONAL GALLIUM NITRIDE SWITCH WITH SELF-MANAGED SUBSTRATE BIAS |
摘要 |
A semiconductor device includes a bidirectional GaN FET formed on a non-insulating substrate. The semiconductor device further includes a first electrical clamp connected between the substrate and a first source/drain node of the bidirectional GaN FET, and a second electrical clamp connected between the substrate and a second source/drain node of the bidirectional GaN FET. The first clamp and the second clamp are configured to bias the substrate at a lower voltage level of an applied bias to the first source/drain node and an applied bias to the second source/drain node, within an offset voltage of the relevant clamp. |
申请公布号 |
US2014374766(A1) |
申请公布日期 |
2014.12.25 |
申请号 |
US201313922352 |
申请日期 |
2013.06.20 |
申请人 |
Texas Instruments Incorporated |
发明人 |
BAHL Sandeep R.;SENESKY Matthew;TIPIRNENI Naveen;ANDERSON David I.;PENDHARKAR Sameer |
分类号 |
H01L27/06;H01L29/20 |
主分类号 |
H01L27/06 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device, comprising:
a bidirectional gallium nitride field effect transistor (GaN FET) formed on III-N layers over a substrate, said substrate being non-insulating, said bidirectional GaN FET having a first source/drain node and a second source/drain node; a first clamp connected between said first source/drain node and said substrate; and a second clamp connected between said second source/drain node and said substrate. |
地址 |
Dallas TX US |