发明名称 |
SURFACE MEASUREMENT DEVICE |
摘要 |
In conventional technologies in surface measurement and defect inspection, considerations are not made for the following points: (1) coarseness of resolution of spatial frequency; (2) variation of detection signal resulting from anisotropy of microroughness; and (3) variation of background signal resulting from anisotropy of microroughness. The present invention is characterized by acquiring a feature quantity about the anisotropy of the microroughness of the substrate surface. Further, the present invention is characterized by acquiring a surface state in consideration of the anisotropy of the microroughness of the substrate surface. Further the present invention is characterized by detecting a defect over the substrate in consideration of the anisotropy of the microroughness of the substrate surface. |
申请公布号 |
US2014375988(A1) |
申请公布日期 |
2014.12.25 |
申请号 |
US201314376479 |
申请日期 |
2013.01.16 |
申请人 |
Hitachi High-Technologies Corporation |
发明人 |
Ito Masaaki;Jingu Takahiro;Kondo Takanori |
分类号 |
G01N21/55;G01N33/00 |
主分类号 |
G01N21/55 |
代理机构 |
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代理人 |
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主权项 |
1. A surface measurement device, comprising:
an illumination optical system for illuminating light on a sample; a plurality of detection optical systems for detecting scattered light from the sample; and a signal processing system for acquiring a continuous 2-D spatial frequency spectrum of the sample using detection signals of the detection optical systems and a library, wherein the 2-D spatial frequency spectrum is defined by two intersecting spatial frequency axes. |
地址 |
Minato-ku, Tokyo JP |