发明名称 SURFACE MEASUREMENT DEVICE
摘要 In conventional technologies in surface measurement and defect inspection, considerations are not made for the following points: (1) coarseness of resolution of spatial frequency; (2) variation of detection signal resulting from anisotropy of microroughness; and (3) variation of background signal resulting from anisotropy of microroughness. The present invention is characterized by acquiring a feature quantity about the anisotropy of the microroughness of the substrate surface. Further, the present invention is characterized by acquiring a surface state in consideration of the anisotropy of the microroughness of the substrate surface. Further the present invention is characterized by detecting a defect over the substrate in consideration of the anisotropy of the microroughness of the substrate surface.
申请公布号 US2014375988(A1) 申请公布日期 2014.12.25
申请号 US201314376479 申请日期 2013.01.16
申请人 Hitachi High-Technologies Corporation 发明人 Ito Masaaki;Jingu Takahiro;Kondo Takanori
分类号 G01N21/55;G01N33/00 主分类号 G01N21/55
代理机构 代理人
主权项 1. A surface measurement device, comprising: an illumination optical system for illuminating light on a sample; a plurality of detection optical systems for detecting scattered light from the sample; and a signal processing system for acquiring a continuous 2-D spatial frequency spectrum of the sample using detection signals of the detection optical systems and a library, wherein the 2-D spatial frequency spectrum is defined by two intersecting spatial frequency axes.
地址 Minato-ku, Tokyo JP