| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for quantitatively evaluating deformation phenomenon of left and right edges of a fine line pattern being deformed in the same shape, namely, degree and characteristics of a waviness, generated in an electronic device manufacturing process, and to provide a device thereof.SOLUTION: In a shape evaluation method of a line pattern, a measured value of variation of a line edge includes waviness, but does not include a variation amount of a line width, by using them, difference thereof is determined. A central position of a line is calculated, and a distribution of deviation from an average position of the central positions is used as an index. In addition, a correlation factor of the waviness between lines, or a synchronized waviness component between lines is outputted as an index, thereby characteristic of the waviness is quantified. |
